The course will provide you with the basic concepts of the engineering principles behind semiconductor processing, wafer fabrication and physical principles underlying the operation of basic semiconductor devices. The contents of the course include the fundamentals of p-n diodes, bipolar devices, MOS devices, deposition techniques, diffusion and thermal oxidation, ion implantation, lithography and etching. Contents: Fundamentals of Bipolar Devices. MOS Devices. Crystal growth and wafer preparation. Deposition Techniques. Diffusion and thermal oxidation. Ion implantation. Lithography. Etching.
Academic Units | 3 |
Exam Schedule | Tue Dec 02 2025 00:00:00 GMT+0000 (Coordinated Universal Time) 09:00-11:00 |
Grade Type | Letter Graded |
Department Maintaining | EEE |
Prerequisites | |
Not Available as BDE/UE to Programme | MAT |
Index | Type | Group | Day | Time | Venue | Remark |
---|---|---|---|---|---|---|
- | LEC/STUDIO | EELE | THU | 1630-1820 | LT23 | Teaching Wk1-9,11-13 |
LEC/STUDIO | EELE | THU | 1630-1820 | ONLINE | Teaching Wk10 |
0930
1030
1130
1230
1330
1430
1530
1630
1730
EE3013
32337
TUT | TR102
Teaching Wk1-9,11-13
EE3013
32337
TUT | ONLINE
Teaching Wk10
EE3013
32338
TUT | TR+65
Teaching Wk1-9,11-13
EE3013
LEC/STUDIO | LT23
Teaching Wk1-9,11-13
EE3013
32338
TUT | ONLINE
Teaching Wk10
EE3013
LEC/STUDIO | ONLINE
Teaching Wk10
EE3013
32339
TUT | ONLINE
Teaching Wk10
EE3013
32339
TUT | TR+62
Teaching Wk1-9,11-13
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